Where high ionisation
meets smoothness

HiPIMS marries the advantages of arc and magnetron sputtering for coatings that open up new performance horizons in cutting tools, automotive and industrial components

High-power impulse magnetron sputtering (HiPIMS)

HiPIMS technology is a special magnetron sputtering technology with high power pulsing. Sputtering creates smooth coatings with reduced friction and sticking. The high power density on the cathode generates ionized atoms, for hard, high-density coatings with good wear resistance. Hauzer HiPIMS technology is highly tunable, with control over power, current, voltage duty cycle and pulse on and off time. A particular benefit of Hauzer HiPIMS is the ability to deposit ta-C, a hydrogen-free DLC coating.

Why Hauzer technology

With Hauzer HiPIMS technology, you reap the benefits of all the ways Hauzer invested
in making this technology even more of a game-changer for businesses.

Unique Hauzer pulse sequence programming feature that unlocks a wide range of control parameters for finetuning coating properties such as hardness and Young’s modulus. These parameters include:
- Pulse width modulation mode
- Block shape mode
Control over coating deposition on cutting edges
No post-treatment required for cutting tools, which is especially beneficial for micro tools, where post-treatment is difficult
Deposition of tetrahedral amorphous carbon (ta-C) coating, with an excellent combination of high hardness, low friction, low sticking and smoothness
Wide range of tunable parameters