Increased etch rates and better uniformity on complex geometries

Focused-ion rapid etch gives you improved productivity during your cleaning and etching step and better product performance

Focused-ion rapid etch (FIR etch) technology

Hauzer systems, although designed for coating deposition, already have what you need to use them for cleaning and etching as well. Argon (Ar) ions, from a plasma generated with a hot filament plasma source, can be accelerated towards and around the products loaded in the chamber. This ion bombardment etches or cleans the surface. The combination of the plasma source and CARC+ Flex technology is what enables focused-ion rapid etch.

Why Hauzer technology

Because of the flexible setup of Hauzer machines, equipping your system with CARC+ Flex also gives you valuable etching capacity.

Improved productivity and performance due to more efficient and powerful etching
Increased plasma density on the table
Plasma steering provides excellent uniformity