For deposition of metal oxide and other low conductivity coatings

For coatings with very low electrical conductivity, a dual magnetron power supply can be connected to two sputter cathodes. By alternating each cathode between negative and positive voltages, both of them remain conductive and the anode functionality is guaranteed. This increases process stability, control and repeatability. Hauzer’s unique T-Mode technology adds a fast control loop for reactive gas flow, enabling the deposition of metal oxide coatings such as Al₂O₃ and excellent control of coating composition.