For deposition of metal oxide and other low conductivity coatings

Dual magnetron sputtering and T-Mode are Hauzer’s solution to the challenges of depositing electrically insulating coatings

Dual magnetron sputtering (DMS) and T-Mode

For coatings with very low electrical conductivity, a dual magnetron power supply can be connected to two sputter cathodes. By alternating each cathode between negative and positive voltages, both of them remain conductive and the anode functionality is guaranteed. This increases process stability, control and repeatability. Hauzer’s unique T-Mode technology adds a fast control loop for reactive gas flow, enabling the deposition of metal oxide coatings such as Al₂O₃ and excellent control of coating composition.

Why Hauzer technology

Dual Magnetron Sputtering and Hauzer’s one-of-a-kind T-Mode offer excellent control over
coating properties, beyond regular magnetron sputtering.

Ability to deposit low-conductivity coatings and metal oxide coatings
Increased process stability and repeatability with bipolar power supply
Excellent coating composition control
Highest possible deposition speed while keeping oxygen content stable

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Ready for your market

Dual magnetron sputtering and T-mode are excellent technologies for the tool markets, where Hauzer has set the global market standard in Al₂O₃ and PVD coatings. Cutting tool manufacturers in Europe and Asia are using this Hauzer-specific technology to bring their PVD aluminium oxide coatings to the next level.

For deposition of metal oxide and other low conductivity coatings

Dual magnetron sputtering (DMS) and T-Mode

Why Hauzer technology

What is your business challenge?

Ready for your market

Cutting tools

Forming tools