Technologies are the foundation of every effective coating, whether it is on a tool, a component or a decorative product. Hauzer offers a broad range of technologies, which can all be combined.
CARC+ is a circular arc evaporation, PVD technology. It produces very smooth coatings, including TiAlN, AlCrN and Si-containing nanocomposite coatings and state-of-the-art hydrogen-free carbon coatings at very high deposition speeds and low cost of ownership.
CARC+ Flex gives increased flexibility in magnetic field design. This gives more control over ionization and coating properties. It also offers uniform target erosion, thicker coatings for special applications and the possibility to program parameters during the coating process, so you will have adequate parameters for different steps in your coating design.
Advanced Controlled Arc
Advanced controlled arc evaporation technology uses rectangular arc cathodes to produce metal nitride, carbonitride and oxide coatings. It is used for coating temperature sensitive products and when a range of attractive colours is required.
Focussed Ion Rapid Etch (FIR Etch)
FIR Etch is based on Hauzer’s plasma source etching technology. The ion beam is enhanced and steered in the chamber, resulting in higher etch rates, perfect adhesion and an increased productivity.
Magnetron sputtering technology is used to produce smooth and well-adhering coatings for applications where friction needs to be reduced. It can also be used for materials with poor electrical conductivity of for special colour requirements. It is often used in combination with PACVD technology for diamond like carbon (DLC) coatings.
Plasma Assisted Chemical Vapour Deposition (PACVD)
Different from PVD, PACVD does not use metallic targets. With PACVD, a plasma is used to crack pre-cursor gasses at relatively low temperatures. The technology is mainly used in combination with hydrocarbon gasses to produce highly wear resistant carbon coatings. DLC coatings can be doped with Si or other elements to tune the coating properties.
High Power Impulse Magnetron Sputtering (HiPIMS)
HiPIMS combines the advantages of high ionization like arc evaporation with the smoothness of magnetron sputtering. This technology opens up extra possibilities to fine-tune the coating properties, such as internal stress and coating structure, of layers that cannot be produced with other existing technologies.
Dual Magnetron Sputtering (DMS) and T-mode
DMS technology is used for the deposition of materials that show very low electrical conductivity. Together with Hauzer’s T-mode technology for fast control of reactive gas flow, this enables the deposition of metal oxide coatings like Al2O3.
PACVD can be further enhanced by using a microwave plasma source for more tuneable properties, higher deposition rates and therefore lower coating cost.
Hauzer has strong engineering skills to provide dedicated handling solutions to enable a perfect fit into the customers production chain.
Because the Hauzer Flexicoat equipment can combine many technologies in one machine, highly effective combination layers can be produced. An example of a hybrid technology is Nitrocoat, a combination of plasma nitriding and coating. Because the technology can be combined in one batch, the typical white layer can be avoided and a strong adhesion is the result. Other examples are CARC+ and DMS or nitride coatings and DLC.
Would you like to know more? Please discuss with us the best technology or combination for your application!