In June 2010, Hauzer CEO Thomas Krug has given a presentation at the EJC workshop in Kiev about Dual Magnetron Sputtering (DMS) and High Power Impulse Magnetron Sputtering (HIPIMS and HIPIMS⁺).

DMS is a superior technology for depositing oxide layers. 

HIPIMS is an excellent technology for plasma etching, becasue the atoms enter into the substrate to give outstanding adhesion.

HIPIMS⁺ is the solution for a dense and defect-free coating. It has a high deposition rate (comparable to arc evaporation) and the possibility to maintain high hardness while achieveing a tuneable residual stress.

The full presentation (9.3 MB) can be downloaded by clicking on the image.